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Piezoelectric aluminum nitride thin films for microelectromechanical systems

机译:用于微机电系统的压电氮化铝薄膜

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摘要

This article reports on the state-of-the-art of the development of aluminum nitride (AlN) thin-film microelectromechanical systems (MEMS) with particular emphasis on acoustic devices for radio frequency (RF) signal processing. Examples of resonant devices are reviewed to highlight the capabilities of AlN as an integrated circuit compatible material for the implementation of RF filters and oscillators. The commercial success of thin-film bulk acoustic resonators is presented to show how AlN has de facto become an industrial standard for the synthesis of high performance duplexers. The article also reports on the development of a new class of AlN acoustic resonators that are directly integrated with circuits and enable a new generation of reconfigurable narrowband filters and oscillators. Research efforts related to the deposition of doped AlN films and the scaling of sputtered AlN films into the nano realm are also provided as examples of possible future material developments that could expand the range of applicability of AlN MEMS
机译:本文报道了氮化铝(AlN)薄膜微机电系统(MEMS)的最新发展,特别着重于用于射频(RF)信号处理的声学设备。回顾了谐振装置的示例,以突出AlN作为实现RF滤波器和振荡器的集成电路兼容材料的功能。展示了薄膜体声谐振器的商业成功,以展示AlN实际上已成为合成高性能双工器的工业标准。该文章还报告了直接与电路集成在一起的新型AlN声谐振器的开发情况,这些谐振器使新一代可重构窄带滤波器和振荡器成为可能。还提供了与掺杂的AlN薄膜的沉积以及溅射的AlN薄膜在纳米领域的定标有关的研究成果,作为可能的未来材料开发实例,这些实例可能会扩展AlN MEMS的适用范围

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